Four-Point Probe Measurement
Resistivity Measurement

FPP-1000 Four-Point Probe Measurement

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Overview
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The FPP-1000 is a manual, contact-based four-point probe measurement tool designed for precise measurement of resistivity, emitter sheet resistance, and doping density in semiconductor wafers, thin films, and solar cells. It is widely used across photovoltaic (PV) and semiconductor R&D sectors as an industry-standard reference technique.

  • Accurate sheet resistance measurement for thin film semiconductor, TCO, and metal layers
  • I-V curve characterization
  • Sample materials: Si, epitaxial layers, metal/implanted layers on Si
  • Sheet resistance measurement of emitter layers in solar cells
  • Widely used in PV industry, thin film resistance measurements, and R&D
  • Industry standard 4-point probe method with Semilab reliability and support
  • Measurement Principle:
    The four point probe (4PP) is a widely used contact technique for monitoring of doping density, resistivity or emitter sheet resistance values. The separation of voltage and current electrodes eliminates the effect of contact resistance from the measurement result. The used voltage is limited so in the high resistivity range the measurable current is getting very small which sets a limitation for the measurement. 
  • High measurement accuracy and excellent repeatability
  • Absolute reference measurement technique with no need for calibration
  • This technology is used to calibrate JPV and Eddy heads
  • Fast, easy operation with clear graphical user interface
  • Durable TC probe tips with high longevity under normal use
  • Versatile: Can handle a wide range of materials including Si wafers, solar cells, metals, TCOs, and other thin film layers
  • Sample Compatibility:
    • Measures various sample types including semiconductor wafers, bulk silicon, implanted silicon, diffusion layer on silicon sample, thin film, metal layers (eg. AI, transparent conductive oxides (TCO), and indium tin oxide (ITO), on glass or silicon substrates
    • Maximum sample size: 210 × 210 mm (M12 PV standard)
    • Can measure non-standard wafer sizes
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FPP-1000 Four-Point Probe Measurement

Related Publications

IEEE Photovoltaic Specialists Conference, IEEE NewYork 2000.) p 99.
2000

Lifetime mapping of Si Wafers by an Infrared Camera

M. Bail, J. Kentsch, R. Brendel, M. Schulz
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FPP-1000 Four-Point Probe Measurement

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