inSE-1000 Spectroscopic Ellipsometry

• Ideal for real-time, in-situ thin film thickness and optical constant measurement; and multilayer stack analysis
• Used on vacuum chambers during deposition or treatment processes and load locks with in-situ thickness measurement capability
• Material types:
  • thin dielectric films (oxide, nitride),
  • porous films,
  • very thin metal layers,
  • graphene,
  • 3D nanostructures,
  • organic layers (OLED, polymers),
  • TCOs,
• Widely employed by universities, R&D labs, PV researchers, optics manufacturers, and pilot production teams

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• High-performance, non-contact, non-destructive optical measurement system for thin films and multilayer stacks
• Measures film thickness and optical constants (refractive index, extinction coefficient, band gap, composition)
• Supports scheduled measurements, custom recipes
• Modern graphical user interface
• Measurement speed: from ~167 ms up to several seconds (typically 1–10 seconds)

• Wavelength range: 245 nm – 990 nm
• Minimum integration time: 167 ms
• Beam divergence: <0.06°
• Angle of incidence: 70° oin testbench