The FPP-1006 is designed for precise measurement of resistivity, emitter sheet resistance, and doping density in semiconductor wafers, thin films, and solar cells, using a 6-electrode contact probe that eliminates contact resistance effects. It is ideal for PV industry standards and semiconductor R&D.
• Accurate sheet resistance measurement for thin film semiconductor, TCO, and metal layers
• Sample materials: Si, epitaxial layers, metal/implanted layers on Si
• Sheet resistance measurement of emitter layers in solar cells.
• Widely used in PV industry, thin film resistance measurements, and R&D
• Industry standard 6-point probe method with Semilab reliability and support
• 6-electrode contact probe eliminating contact resistance effects
• Measurement Principle:
The four point probe (4PP) is a widely used contact technique for monitoring of doping density, resistivity or emitter sheet resistance values. The separation of voltage and current electrodes eliminates the effect of contact resistance from the measurement result. The used voltage is limited so in the high resistivity range the measurable current is getting very small which sets a limitation for the measurement. With our six pin probe (6PP) technique we overcome this problem by using two additional pins to suppress the measurement noise as much as possible.
• High measurement accuracy and excellent repeatability
• Absolute reference measurement technique with no need for calibration
• Fast, easy operation with clear graphical user interface
• Durable probe tips with high longevity under normal use
• Versatile: Can handle a wide range of materials including Si wafers, solar cells, metals, TCOs, and other thin film layers
