This compact tabletop Spectroscopic Ellipsometer delivers precise thin film and optical property measurements in a modular, lab-friendly design. Covering a wide spectral range, it supports film thickness, refractive index, extinction ratio coefficient , and multilayer analysis with flexible measurement modes including ellipsometry, polarimetry, and twelve element Mueller-matrix.

• Widely used in universities, academic research labs, photovoltaic (PV) R&D, optical coating research, and pilot-scale production

• Measures thin film thickness, refractive index (n), extinction coefficient (k), band gap, and composition

• Suitable for:

  • thin dielectric films (oxides, nitrides etc.),
  • porous films,
  • very thin metal layers (eg.: Al, Ti, Ni, Ag, Au etc),
  • graphene,
  • 3D nanostructures (IGZO),
  • organic layers (OLEDs, polymers),
  • TCO,
  • lithography gratings

• Compact tabletop ellipsometer designed for precise thin film and optical property measurement

• Manual goniometer with 60°–75° rotation steps (optionally up to 40°)

• Precision sample positioning table with fast automatic spectroscopic data acquisition

• Recipe-driven measurement flow, supports scheduled measurements

• User-friendly graphical interface

• Measurement time: min. 167 ms, typically 1-5s

• Modular and expandable after installation

• Fits on standard lab benches (compact footprint)

• Wavelength range: 380 nm – 1000 nm (wavelength extension available on additional cost)

• Manual goniometer: 60° - 90°;

• Adjustment step: 5° for 60° - 75° range (wider range available on request on additional cost)

• Adjustable beam diameter: up to 5 mm diameter (Microspot is not included by default, it is available as option)

• Fixed sample stage: up to 200 mm diameter samples

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SE-1000 Spectroscopic Ellipsometry

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SE-1000 Spectroscopic Ellipsometry

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