Small Signal Surface Photo Voltage (SPV) measurement has become a widely accepted metrology for measuring resistivity of epitaxial and Czochralski wafers. For this metrology technique there are currently no Standard Reference Matertials (SRMs®) as defined by the National Institute of Standards and Technology (NIST). This paper will present a method for creating a NIST traceable standard for SPV measurement by further processing NIST 100 mm diameter silicon resistivity, SRM 2543 wafers.
